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Diamond Wheels for Various Wafer Surface Grinding

Business Division
Electronics & Semiconductor
Types of Tools
Grinding Tools
Processing Methods
Grinding
Work
Semiconductor materials, Glass, Ceramics
Bond
Metal, Vitrified, Resin

Product Overview

These diamond wheels are designed for surface grinding of various types of wafers, including those made from semiconductor materials and electronic device materials. We offer the optimal wheel for each specific material. They minimize damage caused by machining, helping to improve processing efficiency and reduce processing costs. Customization to meet your specific needs is available.

Application

  • Silicon semiconductor wafer
  • Compound Semiconductor Wafers
  • Wide-bandgap semiconductor wafers (SiC/GaN)
  • SAW Filter Wafers (LT/LN)
  • Sapphire/Glass Wafers
  • Package Resins (WLP, etc.)
  • Ceramic wafers (Al₂O₃/AlN, etc.)

Types of Adhesives

  • Vitrified
  • Resin
  • Metal

Product Features

Features

Provide various wheels for each applications
Modify wheel specifications upon request of customers

Product Lineup

Resin Wheels
Recommended for Silicon Wafer, Heat sink substrate, and Encapsulation materials
Vitrified wheels
Recommended for almost all "electronic components and semiconductor's substrates and materials
Metal wheel
Recommended for Support substrate, Heat sink substrate, Sapphire, and Encapsulation materials

Target Work

Semiconductor substrate materials
Silicon
Silicon Carbide
Gallium Nitride
Gallium Oxide
Sapphire
Indium Phosphide
Other Compound Semiconductors
Electronic component materials
Lithium Tantalate
Lithium Niobate
Encapsulation materials
Epoxy Molding Compounds
Polyimide Resin
EMC and Copper electrode
Support substrate
Borosilicate Glass
Non-alkali Glass
Quartz Glass
Other glass
Heat sink substrate
Sintered Aluminum Nitride
Sintered Silicon Nitride
Sintered Silicon Carbide
Sintered Alumina Oxide
Other Ceramics

We will also propose the most suitable specifications based on your other requests.

Case Studies on Machining High-Gauge Vitri Wheels

Comparison of Surface Roughness and Damage Depth After High-Grit Wheel Grinding of Various Semiconductor Substrate Materials

Work materialMesh sizeTypes of AdhesivesSurface RoughnessDamage Depth
Φ12-inch-Si#30000Vitrified 1–2 nm≤100 nm
Φ6-inch-LT#8000Vitrified 3–5 nm≤250 nm
Φ6-inch-LN#8000Vitrified 2–4 nm≤350 nm
Φ6-inch SiC#30000Vitrified ≤1 nm≤100 nm
Φ2-inch GaN#30000Vitrified ≤1 nm≤450 nm
Scroll

Other Processing Examples

EMC and Cu

No drag, etc. even with high Cu occupancy.
Less step difference between EMC and Cu.

If you have any questions or would like to discuss anything, please feel free to contact us at
.