Dicing Blade
Diamond wheel for grinding SiC surfaces "M-cloud"
These diamond wheels are designed for surface grinding of various types of wafers, including those made from semiconductor materials and electronic device materials. We offer the optimal wheel for each specific material. They minimize damage caused by machining, helping to improve processing efficiency and reduce processing costs. Customization to meet your specific needs is available.
Provide various wheels for each applications
Modify wheel specifications upon request of customers
Resin Wheels
Recommended for Silicon Wafer, Heat sink substrate, and Encapsulation materials
Vitrified wheels
Recommended for almost all "electronic components and semiconductor's substrates and materials
Metal wheel
Recommended for Support substrate, Heat sink substrate, Sapphire, and Encapsulation materials
We will also propose the most suitable specifications based on your other requests.
Comparison of Surface Roughness and Damage Depth After High-Grit Wheel Grinding of Various Semiconductor Substrate Materials
| Work material | Mesh size | Types of Adhesives | Surface Roughness | Damage Depth |
|---|---|---|---|---|
| Φ12-inch-Si | #30000 | Vitrified | 1–2 nm | ≤100 nm |
| Φ6-inch-LT | #8000 | Vitrified | 3–5 nm | ≤250 nm |
| Φ6-inch-LN | #8000 | Vitrified | 2–4 nm | ≤350 nm |
| Φ6-inch SiC | #30000 | Vitrified | ≤1 nm | ≤100 nm |
| Φ2-inch GaN | #30000 | Vitrified | ≤1 nm | ≤450 nm |

EMC and Cu
No drag, etc. even with high Cu occupancy.
Less step difference between EMC and Cu.
